A 2D material called chromium oxychloride dramatically outperforms traditional hard masks in chip fabrication, resisting plasma etching far better at nanoscale thicknesses.

Researchers at Cornell University have developed a powerful imaging technique that reveals atomic scale defects inside computer chips for the first time. Using an advanced electron microscopy method, ...

Making computer chips smaller is not just about better design. It also depends on a critical step in manufacturing called patterning, where nanoscale ...

Intel has opened its new Fab 52 semiconductor factory in Chandler. The facility will produce the company's most advanced chips for AI, gaming, and robotics, created with its "18A" manufacturing ...